Our Maskless Aligners are high performance direct exposure systems specifically designed for easy operation and high speed exposures. They offer all the capabilities of a traditional Mask Aligner for single layer and multi-layer applications and even overcome some of the limitations of photomask based exposure technologies. The MLA will eliminate the need for photomasks and shorten your development cycle significantly.
For an overview click here – THE NEXT GENERATION OF DIRECT WRITING
MLA100 – Tabletop Maskless Alinger
The performance, small footprint and economical operation of the MLA100 tabletop Maskless Aligner make this tool the perfect lithography solution for protyping and R&D applications on areas up to 100 mm.
For more information click here – MLA100
MLA150 – Maskless Alginer
Representing the next generation of direct exposure systems, the MLA150 combines easy usability, high alignment accuracy, and fast speed to provide the perfect maskless lithography solution for areas up to 150 mm.
For more information click here – MLA150